![]() ![]() The flux can include vapor including atoms or other particles of a material being deposited on a surface of a substrate. The process can be monitored in one aspect by observing and/or measuring information relating to the flux of the vapor being deposited, such as the vapor flux density. For example, a “layer” can mean any amount of any material that contacts all or a portion of a surface. Each layer can cover all or a portion of the device and/or all or a portion of the layer or substrate underlying the layer. Each layer may include more than one layer or film. For example, a photovoltaic device can include layers of semiconductor, metal, and/or other suitable materials created (e.g., formed or deposited) adjacent to a substrate. Photovoltaic devices can include multiple layers formed on a substrate. atomic absorption spectrometry using tunable lasers G01N21/39- Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g.G01N21/3103- Atomic absorption analysis.G01N21/31- Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g.comparison of effect of material on the light at two or more different wavelengths or wavelength bands G01N21/25- Colour Spectral properties, i.e.C23C14/544- Controlling the film thickness or evaporation rate using measurement in the gas phase.C23C14/542- Controlling the film thickness or evaporation rate.C23C14/54- Controlling or regulating the coating process.C23C14/22- Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating.C23C14/00- Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material.C23C- COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL.C23- COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMICAL SURFACE TREATMENT DIFFUSION TREATMENT OF METALLIC MATERIAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL.G01N21/17- Systems in which incident light is modified in accordance with the properties of the material investigated.using sub-millimetre waves, infrared, visible or ultraviolet light G01N21/00- Investigating or analysing materials by the use of optical means, i.e. ![]() G01N- INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES.Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Application filed by First Solar Inc filed Critical First Solar Inc Priority to US14/140,687 priority Critical patent/US9383316B2/en Publication of US20140104616A1 publication Critical patent/US20140104616A1/en Application granted granted Critical Publication of US9383316B2 publication Critical patent/US9383316B2/en Status Expired - Fee Related legal-status Critical Current Adjusted expiration legal-status Critical Links Original Assignee First Solar Inc Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) Bonne Raffi Garabedian Erel Milshtein Ming Lun Yu Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) Granted Application number US14/140,687 Other versions US9383316B2 ![]()
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